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Atomic layer deposition of tungsten film from WF6/B2H6: Nucleation layer for advanced semiconductor devices
Atomic layer deposition of tungsten film from WF6/B2H6: Nucleation layer for advanced semiconductor devices
2001
Michael Yang
Hua Chung
Alex Yoon
Hongbin Fang
Amy Zhang
Cheryl Knepfler
Robert Jackson
Jeong Soo Byun
Alfred Mak
Moshe Eizenberg
Ming Xi
Moris Kori
A. K. Sinha
Keywords:
Tungsten film
Nucleation
Optoelectronics
Semiconductor device
Materials science
Atomic layer deposition
layer
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