Simulation of substrate temperature in HFCVD diamond thin films

The substrate temperature is one of the most important parameters for the synthesis of high quality diamond thin films in hot filament chemical vapor deposition (HFCVD) system. Based on the principle of heat transfer, the substrate temperature is calculated in the single hot filament system, the influence of filament height, filament diameter and filament length on substrate temperature are also discussed. Results show that the substrate temperatures vary with the space position. In the direction of parallel with the filament, the substrate temperatures vary smoothly, but, in the vertical direction of the filament, the substrate temperatures change acutely. When H=8mm, L=7cm and d f =0.5mm, the substrate temperatures are well-distributed, this will give the support of some technique parameters for the growth of large area HFCVD diamond thin films.