A method of manufacturing an optoelectronic component and optoelectronic component

A method of manufacturing an optoelectronic device (200) may comprise: applying a planarizing medium (104) on a surface of a substrate (102), wherein the planarizing medium (104) comprises a material (106), which electromagnetic radiation having wavelengths of at most 600 nm absorbed; depositing a first electrode (112) on or over the material (106); forming an organic functional layer structure (114) on or above the first electrode (112); and forming a second electrode (116) on or above the organic functional layer structure (114).