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Investigation of the influence of plasma source power on the properties of magnetron sputtered Ta2O5 thin films
Investigation of the influence of plasma source power on the properties of magnetron sputtered Ta2O5 thin films
2021
Manuel Bärtschi
Daniel Schachtler
Silvia Schwyn Thöny
Thomas Südmeyer
Roelene Botha
Keywords:
Optoelectronics
Cavity magnetron
Plasma
Materials science
Power (physics)
Thin film
Correction
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