Influences of post-annealing on structural, morphological and electrical properties of Cd1−xMnxTe films

Abstract Cd 1− x Mn x Te films were grown on SnO 2 :F (FTO)-coated glass substrates by close-spaced sublimation method. After deposition, the films were etched by Br-MeOH (BM) solution followed by two separate annealing processes. One was only carried out in N 2 directly, and the other was further annealed in MnCl 2 . XRD, SEM, EDS and I – V measurement were employed to investigate the influences of post-annealing on the structure and properties of Cd 1− x Mn x Te films. Uniform Cd 1− x Mn x Te films with high quality and high resistivity were obtained by BM/N 2 post-treatment.