Semiconductor Factory Control and Optimization

1999 
The sections in this article are 1 Control in Breadth 2 Generic Model of the Elements of a Controller 3 Control in Depth 4 Change Management 5 Statistical Process Control 6 Run-to-Run Model-Based Process Control 7 Equipment Signal Monitoring, Real-Time Fault Detection and Classification 8 Sensors 9 In Situ Particle Monitors 10 In-Line Defect Monitoring and Contamination Control 11 Wafer Position Tracking 12 Data Mining and Data Warehousing 13 Parametric and Yield Outlier Control 14 Wafer Level Reliability Control 15 Multivariate SPC, Especially for Equipment Signal Monitoring 16 Acknowledgments
    • Correction
    • Source
    • Cite
    • Save
    • Machine Reading By IdeaReader
    0
    References
    1
    Citations
    NaN
    KQI
    []