Semiconductor Factory Control and Optimization
1999
The sections in this article are
1
Control in Breadth
2
Generic Model of the Elements of a Controller
3
Control in Depth
4
Change Management
5
Statistical Process Control
6
Run-to-Run Model-Based Process Control
7
Equipment Signal Monitoring, Real-Time Fault Detection and Classification
8
Sensors
9
In Situ Particle Monitors
10
In-Line Defect Monitoring and Contamination Control
11
Wafer Position Tracking
12
Data Mining and Data Warehousing
13
Parametric and Yield Outlier Control
14
Wafer Level Reliability Control
15
Multivariate SPC, Especially for Equipment Signal Monitoring
16
Acknowledgments
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