Microfabrication of Magnetic Tunnel Junctions Using CH $_{3}$ OH Etching

The 100-nm-scale CoFeB/MgO/CoFeB magnetic tunnel junctions (MTJs) were fabricated using a CH 3 OH etching process. These MTJs have steep side walls and show clear MR loops. The distributions of magnetic properties of CH 3 OH etched MTJs were smaller than those of conventional Ar ion etched MTJs