Illumination optics for projection lithography

An illumination optics (4) for the projection lithography for illuminating an object field (5), in which an object to be imaged (7) can be arranged, with illumination light, having a field facet mirror (20) having a plurality of field facets. A pupil facet mirror (21) the illumination optics (4) has a plurality of pupil facets. The pupil facets are used for imaging the individually assigned to the pupil facets of the field facet in the object field (5). A single mirror array (17) of the illumination optics (4) individually driven tiltable individual mirrors. The single mirror array (17) is disposed in an illumination light beam path in front of the field facet mirror (20). The result is a flexibly designed and well adaptable to default values ​​illumination by the illumination optics.