Graphite plate for improving uniformity of MOCVD (Metal Organic Chemical Vapor Deposition) epitaxial wafer

The utility model discloses a graphite plate for improving uniformity of an MOCVD (Metal Organic Chemical Vapor Deposition) epitaxial wafer and relates to a structural design of MOCVD epitaxial wafer production equipment, namely the graphite plate. The graphite plate comprises a large graphite plate and a small graphite plate, wherein a small ventilation hole and a connecting pin are arranged on the large graphite plate; a supporting groove matched with the connecting pin is formed in the back of the center of the small graphite plate; the small graphite plate is arranged above the large graphite plate by matching the supporting groove and the connecting pin; a central wafer groove and edge wafer grooves are formed in the small graphite plate. The graphite plate is characterized in that a cylindrical groove is formed in the back of the large graphite plate; the groove and the connecting pin are arranged on the same axis. According to the graphite plate, a phenomenon of higher local temperature in the center of the small graphite plate caused by heat conduction of the connecting pin is compensated, so that a temperature difference phenomenon of the small graphite plate is improved. Meanwhile, the temperature of the central wafer groove and the edge wafer grooves in the small graphite plate is consistent, and finally, an epitaxial wafer with high uniformity is obtained on the small graphite plate.