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Block co-polymers for etch mask definition to create anti-reflective surfaces
Block co-polymers for etch mask definition to create anti-reflective surfaces
2020
Brian D. Jennings
Riley Gatensby
Elsa C. Giraud
Andrew Selkirk
Sajjad Husain Mir
Ramsankar Senthamaraikannan
Parvaneh Mokarian-Tabari
Keywords:
Polymer
Nanotechnology
anti reflective
Materials science
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