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Evaluation of Plasma Ashing Damages on Porous SiOCH Films by Measurement of H and N Radical Densities
Evaluation of Plasma Ashing Damages on Porous SiOCH Films by Measurement of H and N Radical Densities
2008
Hiroshi Yamamoto
Keigo Takeda
Makoto Sekine
Masaru Hori
Keywords:
Dielectric
Radiochemistry
Plasma processing
Absorption spectroscopy
Chemical reaction
Ultraviolet
Porosity
Plasma ashing
Nuclear magnetic resonance
Chemistry
Analytical chemistry
Materials science
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