Method for preparing high-purity submicron hydrated silica and silica microparticles in batch

The invention relates to the technical field of semiconductor and solar-grade silicon materials, in particular to a method for preparing high-purity submicron hydrated silica and silicon microparticles in batch. The method comprises the following steps of adopting microfine diamond wires to grind and cut high-purity silicon rods or silicon ingots under the assistance of deionized water; after the concentrations of the silicon microparticles reach 10 weight percent, purifying and separating a mixture to form filter pressing water and hydrated silica microparticles; purifying the filter pressing water and then recycling; and performing vacuum freeze drying on the hydrated silica microparticles to form high-purity silicon microparticles. Compared with the prior art, the method has the advantages that the high-purity silicon rods are ground and cut under the action of the deionized water by using a microfine diamond wire cutting technique to prepare a high-purity silicon wafer; meanwhile, the cut mixture of the deionized water and the silicon microparticles is purified to prepare the high-purity hydrated silica microparticles or the high-purity silicon microparticles, and the high-purity hydrated silica microparticles or the high-purity silicon microparticles realize resource utilization; and an aqueous solution purified by the silicon microparticles is purified and then can be injected into the process of the microfine diamond wire cutting technique for recycling.