Method for producing coating based on silicon dioxide of quartz article inner surface

FIELD: metallurgy. SUBSTANCE: method for producing silica-based coating on the inner surface of a quartz article involves introduction of silicon tetrachloride and water into the reaction zone and the deposition of dioxide film on the surface. Silicon tetrachloride and water are introduced into the reaction zone in dried air flow at atmospheric pressure and volume ratio of silicon tetrachloride and water at 1:(2÷4). Formation of the coating in the form of silicon dioxide is carried out for 10-30 minutes at a temperature of 23°C and atmospheric pressure, followed by heat treatment at 1150°C for 30 min. EFFECT: production of silica dioxide coating on the inner surface of quartz article with low energy consumption and reasonable consumption of the initial reagents. 3 ex