A silicon photonic quasi-crystal structure obtained by interference lithography
2012
Photonic quasi-crystal structures have been prepared and investigated. Symmetrical patterns were fabricated by
interference lithography in negative tone photoresist and transferred to silicon by reactive ion etching. Theoretical
influences of pattern detail (radius of hole) on the photonic band gap have been studied. Three types of 2D photonic
quasi-crystals have been prepared: 8-fold, 10-fold and 12-fold pattern. Finally, finite-difference time-domain method was
used for theoretically prediction of transmission spectrum for fabricated 12-fold quasi-crystal.
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