Direct comparison of atomic layer deposition and sputtering of In2O3:H used as transparent conductive oxide layer in CuIn1−xGaxSe2 thin film solar cells

In this study thin films of hydrogenated In2O3 (IOH) were fabricated by physical vapor deposition (PVD) with and without a post-annealing step, and by atomic layer deposition (ALD). The electro-opt ...