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Analysis of Surface Roughness during Si Etching in Cl 2 Plasmas: Effects of Initial Surface Roughness
Analysis of Surface Roughness during Si Etching in Cl 2 Plasmas: Effects of Initial Surface Roughness
2015
Haruka Matsumoto
Keywords:
Surface roughness
Dry etching
Plasma
Etching
Reactive-ion etching
Analytical chemistry
Materials science
Composite material
Correction
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