Patternable materials, processes for their preparation and their use

The invention relates to low-molecular or polymeric organic materials wherein at least one H atom is replaced by a group of the formula (A), wherein R is a straight-chain, branched or cyclic alkyl, alkoxyalkyl, alkoxy or thioalkoxy group having 1 to 20 C atoms, C4-C18 aryl, C2-C10 alkenyl, wherein one or more hydrogen atoms may be replaced by halogen, such a Cl and F, or CN, and wherein one or more non-neighboring C atoms may be replaced by -O-, -S-, -CO-, -COO-, -O-CO-, Z represents -O-, -S-, -CO-, -COO-, -O-CO- or a bivalent group -(CR1-R2)n-, wherein R1 and R2 independently represent hydrogen, a straight-chain, branched or cyclic alkyl, alkoxy, alkoxyalkyl or thioalkoxy group having 1 to 20 C atoms, C4-C18 aryl, C2-C10 alkenyl, wherein one or more hydrogen atoms may be replaced by halogen, such as Cl and F, or CN, and wherein one or more non-neighboring C atoms may be replaced by -O-, -S-, -CO-, -COO-, -O-CO-, X represents a bivalent group -(CR1R2)n- wherein R1 and R2 independently represent hydrogen, a straight-chain, branched or cyclic alkyl, alkoxy, alkoxyalkyl or thioalkoxy group heaving 1 to 20 C atoms, C4-C18 aryl, C2-C10 alkenyl, wherein one or more hydrogen atoms may be replaced by halogen, such as Cl and F, or CN, and n represents an integer between 1 and 20, preferably between 3 and 10, and particularly between 3 or 6, with the proviso that the number of the groups A is limited by the H atoms that are maximally available, that means that can be maximally substituted. The invention further relates to the use of said compounds for producing optionally multilayer structured light-emitting diodes, lasers, solar cells, waveguides or integrated circuits.