Interface characterization of highly conductive Ga-doped ZnO thin films deposited onto Si wafers

M. Gabás,José Luis Costa Krämer,Ángel Landa Cánovas,Pilar Herrero,F Agullo Rueda,P. Díaz-Carrasco,J. Ramón Ramos-Barrado

Interface characterization of highly conductive Ga-doped ZnO thin films deposited onto Si wafers

2012

M. Gabás
José Luis Costa Krämer
Ángel Landa Cánovas
Pilar Herrero
F Agullo Rueda
P. Díaz-Carrasco
J. Ramón Ramos-Barrado

Comunicacion presentada en el 4th International Symposium on Transparent Conductive Materials (TCM 2012), celebrado en Creta del 21 al 26 de octubre de 2012.

Keywords:

Thin film
Doping
Nanotechnology
Wafer
Electrical conductor
Materials science
Composite material
conductive materials

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