MOLECULAR BEAM EPITAXY GROWTH METHOD FOR VERTICAL-CAVITY SURFACE-EMITTING LASER RESONATORS BASED ON SUBSTRATE THERMAL EMISSION

1995 
A molecular beam epitaxy growth monitoring method is developed for distributed Bragg reflectors and vertical‐cavity surface‐emitting laser (VCSEL) resonators. The wavelength of the substrate thermal emission that corresponds to the optical cavity resonant wavelength is selected by a monochromator and monitored during growth. This method allows VCSEL cavities of arbitrary design wavelength to be grown with a single control program. This letter also presents a theoretical model for the technique which is based on transmission matrices and simple thermal emission properties. Demonstrated reproducibility of the method is well within 0.1%.
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