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Segregation and diffusion of boron dopants in the Si/SiO$_2$ interface
Segregation and diffusion of boron dopants in the Si/SiO$_2$ interface
2012
Young Jun Oh
Hyeon-Kyun Noh
Gh Kim
Kee-Joo Chang
Keywords:
Boron
Dopant
Inorganic chemistry
Materials science
Chemical engineering
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