IMPACT OF DISTANCE FROM THE VIRTUAL BASAL RING TO INFERIOR MARGIN OF THE MEMBRANOUS SEPTUM ON POSTPROCEDURAL CONDUCTION DAMAGE FOLLOWING TRANSCATHETER AORTIC VALVE IMPLANTATION

Conduction damage following transcatheter aortic valve implantation (TAVI) is common, with poorly understood anatomical risk factors. Inferior distance measured from the virtual basal ring to inferior margin of the membranous septum, corresponding to the atrioventricular conduction axis location,