Basic aspects of deep Lithography with Particles for the Fabrication of Micro-Optical and Micromechanical Structures
2004
The strength of today's deep lithographic micro-machining
technologies is their ability to fabricate monolithic
building-blocks including optical and mechanical functionalities
that can be precisely integrated in more complex photonic systems.
In this contribution we present the physical aspects of Deep
Lithography with ion Particles (DLP). We investigate the impact of
the ion mass, energy and fluence on the developed surface profile
to find the optimized irradiation conditions for different types
of high aspect ratio micro-optical structures. To this aim, we
develop a software program that combines the atomic interaction
effects with the macroscopic beam specifications. We illustrate
the correctness of our simulations with experimental data that we
obtained in a collaboration established between the accelerator
facilities at TUM, LNS and VUB. Finally, we review our findings
and discuss the strengths and weaknesses of DLP with respect to
Deep Lithography with X-rays (LIGA).
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