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Bias-applied hard x-ray photoelectron spectroscopy study of HfO 2 /SiO 2 interface dipole modulation
Bias-applied hard x-ray photoelectron spectroscopy study of HfO 2 /SiO 2 interface dipole modulation
2019
Hiroshi Nohira
Reito Wada
Akira Yasui
Noriyuki Miyata
Keywords:
Dipole
X-ray photoelectron spectroscopy
Modulation
Molecular physics
Materials science
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