Nanomechanical Mass Sensor for Spatially Resolved Ultrasensitive Monitoring of Deposition Rates in Stencil Lithography

Keywords: mass sensors ; nanoelectromechanical systems ; nanolithography ; nanomechanical sensors ; High-Frequency Applications ; Cmos-Mems ; Devices Reference LMIS1-ARTICLE-2009-006doi:10.1002/smll.200990007View record in Web of Science Record created on 2009-01-28, modified on 2017-05-10