Pixel structure and manufacturing method thereof

The invention provides a pixel structure. In the structure, a substrate is provided with a first component region and a second component region; a first polycrystalline silicon pattern is positioned in the first component region; a first insulating pattern is positioned on the first polycrystalline silicon pattern; a second polycrystalline silicon pattern is positioned in the second component region; a second insulating pattern is positioned on the second polycrystalline silicon pattern, and is separated from the first insulating pattern; an insulating layer covers the first and second insulating patterns; a first grid and a second grid are positioned on the insulating layer; a first covering layer covers the first grid and the second grid; a first source/drain metal layer is positioned on the first covering layer and electrically connected a first source/drain region in the first polycrystalline silicon pattern respectively; a second source/drain metal layer is positioned on the first covering layer and is electrically connected with a second source/drain region in the second polycrystalline silicon pattern; a second covering layer covers the first source/drain metal layer and the second source/drain metal layer; and a pixel electrode is positioned on the second covering layer and is electrically connected with the first drain metal layer.