Wavefront aberration of plane diffraction gratings fabricated in a Lloyd’s mirror interferometer

A Lloyd’s mirror interferometer is widely used in holographic lithography to fabricate gratings. Adjustment errors of the interferometer and manufacturing errors of optical elements will both influence the wavefront aberration of a grating. We analyze their influence and propose a method to optimize the wavefront aberration. The correctness of the simulation and the feasibility of the adjustment method are experimentally verified. With this method, low-aberration gratings can be fabricated in a Lloyd’s mirror interferometer.