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New Self-aligned Metal-gate MOSFETs Using Aluminum Substitution Technology
New Self-aligned Metal-gate MOSFETs Using Aluminum Substitution Technology
2003
S. Nakamura
Hideharu Shido
Teruo Kurahashi
S. Kishii
Takeo Nagata
B. Kumasaka
T. Usuki
Shintaro Sato
Yasuyoshi Mishima
Keywords:
Metal gate
Nanotechnology
Electronic engineering
Aluminium
Materials science
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