A method of mechanical stabilization of ultra-high-AR microstructures
2016
Abstract Deep X-ray lithography with synchrotron radiation can be successfully used in fabrication of high-aspect-ratio microstructures (HARMs) micrometers up to several millimetres high. As such microstructures are often mechanically unstable, a supporting layer incorporated into a micropattern, was developed and studied.
Keywords:
- Correction
- Source
- Cite
- Save
- Machine Reading By IdeaReader
28
References
4
Citations
NaN
KQI