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Improvement of Photoresist selectivity during etching silicon oxynitride using SF6 gas
Improvement of Photoresist selectivity during etching silicon oxynitride using SF6 gas
2010
Nam-Gun Kim
Sung-il Cho
Chul-Ho Shin
Sang-Sup Jeong
Seokwoo Nam
Keywords:
Selectivity
Etching (microfabrication)
Etching
Photoresist
Silicon oxynitride
Materials science
Inorganic chemistry
Optoelectronics
Correction
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