Femtosecond pulsed laser deposition of Nd:YAG laser crystal films

Pulsed Laser Deposition of Neodymium doped Yttrium Aluminum Garnet (Nd:Y3Al5O12) laser crystal films on Si (100) substrate has been performed. A mode-locked femtosecond laser operating at = 785 nm with 100 fs pulse duration and 80 MHz repetition rate was used to ablate the Nd:YAG crystal to provide the deposition flux. The SEM micrographs reveals rectangular grains on film surface. XRD measurement shows preferential growth of (321) Nd: YAG crystals using 500 mW laser power at 10−6 mbar deposition pressure for 2hrs.