A Supercritical Lens Optical Label‐Free Microscopy: Sub‐Diffraction Resolution and Ultra‐Long Working Distance

: A planar metalens for achieving super-resolution imaging in far-field is proposed. This metalens, which has a non-sub-wavelength feature size, can be fabricated by conventional laser pattern generator. The imaging process is purely physical and captured in real time, without any pre- and post-processing.