Plasma enhanced aerosol–gel deposition of Al2O3 coatings

Abstract The new plasma enhanced aerosol–gel technique has been used for alumina films preparation, in this work. This process integrates aerosol–gel deposition of films and their plasma treatment in one reactor. The alumina films deposited by aerosol–gel method on Si substrate were plasma or thermally treated. The influence of deposition and condensation conditions on properties of the films was studied. Produced coatings were characterized in terms of surface morphology (SEM, AFM) as well as crystalline and chemical structure (FTIR, XRD). Plasma discharge used for modification of the substrates prior to the deposition process improved homogeneity of produced coatings. Coatings obtained at room temperature exhibit boehmite structure which was transformed into γ-Al 2 O 3 after annealing. A similar transformation was induced by low temperature oxide plasma discharge treatment for sufficiently thin coatings.