INTERFACIAL BONDING IN AS DEPOSITED AND ANNEALED Co/C SOFT X RAY MULTILAYER MIRRORS

Interfacial bonding in as deposited and annealed Co/C soft X ray multilayer structures is investigated by X ray photo electron spectroscopy (XPS).It is found that there is interdiffusion between cobalt and carbon in the as deposited Co/C multilayers,and this is confirmed by structure characterization using low angle X ray diffraction (LAXD).The calculation of the chemical shifts in Co C system based on Miedemas macroscopic atom model suggests that it is impossible to detect the chemical shift experimentally in the Co C compound,which is consistent with the XPS results.The presence of metallic carbide bonding is evidenced through the nature of the carbon bonding in survey taken at Co C and C Co interfaces of annealed samples.Our results also indicate that XPS is a direct method to probe the chemical bonding at the interfaces.