Old Web
English
Sign In
Acemap
>
Paper
>
Understanding the photoresist surface-liquid interface for ArF immersion lithography
Understanding the photoresist surface-liquid interface for ArF immersion lithography
2005
Will Conley
Robert J. LeSuer
Frank F. Fan
Allen J. Bard
Chris Taylor
Pavlos C. Tsiartas
Carlton G Willson
Andrew Romano
Ralph R. Dammel
Keywords:
Photoresist
Materials science
Optoelectronics
Immersion lithography
liquid interface
Correction
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]