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Manufacturability and Speed Performance Demonstration of Porous ULK (k=2.5) for a 45nm CMOS Platform
Manufacturability and Speed Performance Demonstration of Porous ULK (k=2.5) for a 45nm CMOS Platform
2007
Elise Richard
Robert Allen Fox
C. Monget
Mathew Zaleski
Paulo Ferreira
A. F. Guvenilir
Pierre Brun
E. Oilier
M. Guillermet
M. Mellier
Sébastien Petitdidier
R. Delsol
Wim F. A. Besling
Laurent Marinier
Gilles Imbert
Ahcene Lagha
Lucile Broussous
M. Rasco
Corinne Cregut
S. Downey
Garng M. Huang
Michel Haond
Nigel Cave
A. G. Unil Perera
Keywords:
Numerical aperture
Optical proximity correction
Optoelectronics
CMOS
Design for manufacturability
Porosity
Materials science
Correction
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