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Reducing agents for the atomic layer deposition of WS2 from the WF6 and H2S precursors
Reducing agents for the atomic layer deposition of WS2 from the WF6 and H2S precursors
2015
Annelies Delabie
Markus Heyne
Benjamin Groven
Karel Haesevoets
Johan Meersschaut
Thomas Nuytten
Patrick Verdonck
Sven Van Elshocht
Marc Heyns
Iuliana Radu
Matty Caymax
Keywords:
Reducing agent
Atomic layer deposition
Inorganic chemistry
Materials science
Chemical engineering
Correction
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