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Metal-Coated Lightly-Doped Drain (MLD) MOSFET's for Sub-Micron VLSI's
Metal-Coated Lightly-Doped Drain (MLD) MOSFET's for Sub-Micron VLSI's
1985
Yoshitaka Tsunashima
T. Wada
K. Yamada
T. Moriya
K. Taniguchi
M. Kashiwagi
Hiroyuki Tango
Masahiro Nakamura
R. Dang
Keywords:
Electronic engineering
Impact ionization
Engineering
Micrometre
Very-large-scale integration
Doping
Sheet resistance
MOSFET
Metal
Silicon
Electron
Correction
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