X-ray photoelectron spectra of adhesion-enhanced a-Si:H on stainless steel induced by plasma treatments

Abstract An investigation by X-ray photoelectron spectroscopy (XPS) of adhesion mechanisms of a-Si:H films on stainless steel substrates after hydrogen (H 2 ), nitrogen (N 2 ) and ammonia (NH 3 ) plasma treatments of the surface is presented. It is shown that adhesion is increased by N 2 treatment. This effect is related to chemical bonding states at the interface. The improvement is attributed to the formation of silicon nitride at the interface and to the existence of Fe–Fe metallic bonds which contribute to a hardening of the substrate.