Production and characterization of large area flexible thin film position sensitive detectors

Abstract Flexible large area thin film position sensitive detectors based on amorphous silicon technology were prepared on polyimide substrates using the conventional plasma enhanced chemical vapor deposition technique. The sensors were characterized by spectral response, illuminated I–V characteristics position detectability measurements and atomic force microscopy. The obtained one-dimensional position sensors, 5-mm wide and 60-mm long, presented a maximum spectral response at 600 nm, an open circuit voltage of 0.6 V and a position detectability with a correlation of 0.9989 associated to a S.D. of 1×10 −2 , comparable to those produced on glass substrates.