Effect of oxygen partial pressure and anneal temperature on BaTiO3 thin film crystal structure

BaTiO 3 film is deposited on single crystal MgO substrate with pulsed laser deposition, and its crystal structure and surface roughness are characterized by X-ray diffraction instrument and atomic force microscope. BaTiO 3 film crystal quality is analyzed under three different oxygen partial pressure and three different annealing temperatures. The result shows that when the oxygen partial pressure is 15Pa, crystal surface (001) and (002) diffraction peak of BaTiO 3 thin films have higher intensity. It indicated that the film has a good c-axis orientation. When the annealing temperature is 800°C, the intensity of diffraction peak is the maximum, and peak shape is sharper. BaTiO 3 crystal film is obtained with highly preferred orientation, and film density is improved. Thus the film has less surface roughness and good crystalline state.