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Infinitely high selective etching of ITO binary mask structure for extreme ultraviolet lithography (EUVL)
Infinitely high selective etching of ITO binary mask structure for extreme ultraviolet lithography (EUVL)
2009
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서환석
Keywords:
Etching
Extreme ultraviolet lithography
Optoelectronics
Optics
Materials science
Binary number
Nanotechnology
Correction
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