Pipeline cooled gas distribution device used for metal organic chemical vapour deposition reactor

The invention discloses a pipeline cooled gas distribution device used for a metal organic chemical vapour deposition reactor. The pipeline cooled gas distribution device comprises a gas spray tray, wherein a gas connecting plate is arranged above the gas spray tray, and a gas distribution plate is arranged between the gas connecting plate and the gas spray tray; and cooling liquid pipelines are arranged between every two structural plates, and each cooling liquid pipeline is made by bending one pipeline or splicing and welding multiple pipelines. The gas spraying head is also provided with a plurality of gas channels which are isolated from each other, such as a first precursor gas channel, a second precursor gas channel and a carrier gas channel, wherein the gas channels are connected with corresponding gas ports and can feed corresponding gases into a reaction chamber independently. According to the pipeline cooled gas distribution device used for a metal organic chemical vapour deposition reactor, pipeline type cooling is adopted, so that manufacturing difficulty of a spraying head is reduced, and sealing property and sealing reliability of the cooling liquid pipelines in the spraying head are improved.