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Improved Electrical Stability of Zr-IGZO Thin-Film Transistors with Zr 0.85 Si 0.15 O 2 Gate Dielectric
Improved Electrical Stability of Zr-IGZO Thin-Film Transistors with Zr 0.85 Si 0.15 O 2 Gate Dielectric
2018
Z.K. Zhuang
S. J. Wang
S. Y. Wang
H. Y. Chen
C K Liao
S T. Hsiao
B. C. You
R.M. Ko
Keywords:
electrical stability
Optoelectronics
Gate dielectric
Thin-film transistor
Materials science
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