The method of preparing an array substrate and a display device

Example discloses an array substrate and a preparation method of the present invention, the display device relates to the field of display technology, a metal such as copper oxide can be prevented from occurring during the patterning of the transparent conductive thin film process, to ensure that the source and drain of the conductive ability. This kind of array substrate, comprising a plurality of pixel unit areas arranged in an array, the pixel unit includes a region between the thin film transistor and a pixel electrode, an active layer of the thin film transistor and the pixel electrode is formed with a first insulating layer, the first insulating layer is formed with a first hole and a second through hole through said first through hole and the second through holes respectively corresponding to the two ends of the active layer, a source electrode of the thin film transistor by the first active layer via hole connected to the drain of the thin film transistor is overlapped on the pixel electrode and the active layer via the second via hole.