Electron energy distribution function in superhigh-frequency low-pressure discharge in an O2 and O2/SiCl4 gas mixture

The electron energy distribution function (EEDF) and its dynamics with respect to absorptivity are found for a superhigh-frequency discharge in an O 2 and O 2 /SiCl 4 gas mixture at a low pressure of the plasma-generating gas. The effect of the EEDF on the nature of the deposition process is analyzed.