Gas jet deposition of metallic, semiconducting and insulating thin films: Annual report: First year, November 15, 1987--June 21, 1988

In the Work Calendar on page 19 of our original proposal we listed four research tasks to be completed in our first year. The work plan is reproduced on page 12 of this report, but the four tasks, in abbreviated form, are: (1) devise chemical nozzle sources for gas jet deposition; (2) deposit representative metals, semiconductors, insulators and organics; begin to characterize them; (3) set up a quadrupole mass spectrometer; and (4) refine the computer control of substrate motion. The representative metals, semiconductors, insulators, and organics are drawn from a list given on page 12 of this report. We describe our progress to date for each of the tasks (1) through (4) in the sections that follow. 3 figs., 1 tab.