FTIR Studies of the Adsorption/Desorption Behavior of Cu Chemical Vapor Deposition Precursors on Silica III . Re‐examination of (1,1,1,5,5,5‐hexafluoroacetylacetonato)(vinyltrimethylsilane)copper(I),

The reaction of (hfac)Cu(VTMS) with SiO 2 surfaces with varying surface concentrations of isolated and hydrogen-bonded surface hydroxyl groups and four-membered SiO rings has been investigated. The adsorbed (hfac)Cu(VTMS) (where hfac=1,1,1,5,5,5-hexafluoroacetylacetonate and VTMS=vinyltrimethylsilane) reacted with the hydrogen-bonded surface hydroxyl groups and the strained siloxane sites and interacted with the isolated surface hydroxyl groups. The VTMS ligand was completely liberated from the adsorbed compound between 125 and 175 o C depending on the relative ratios of the reactive surface sites. Because all SiO 2 surfaces have some combination of these reactive sites, dissociation of (hfac)Cu(VTMS) to give «(hfac)Cu» and VTMS is always expected