Development and implementation of PWQ on patterned wafer darkfield inspection systems
2009
Process Window Qualification (PWQ) is a well-established wafer inspection technique used to qualify the design of
mask sets and to characterize lithography process windows. While PWQ typically employs a broadband brightfield
inspector, novel techniques for patterned wafer darkfield inspection have proven to provide sufficient sensitivity along
with noise suppression benefits for lithography layers. This paper describes the introduction and implementation of
PWQ on patterned wafer darkfield inspectors. An initial project characterized critical PWQ requirements on the
darkfield inspector. The results showed that this new approach meets performance requirements, such as defect of
interest (DOI) detection and process window characterization, as well as ease-of-use requirements such as automated
setup for advanced design rule products.
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