Role of micro-nano fabrication process on the temperature coefficient of resistance of platinum thin films resistance temperature detector

Abstract In this work, we studied the effect of micro-nano fabrication process on the temperature coefficient of resistance (TCR) of platinum thin films temperature detector (Pt RTD) prepared on alumina ceramics (Al2O3) substrate, focusing on substrate chemical polishing process (CMP) and platinum films annealing process. It is found that CMP process can effectively improve the TCR of Pt RTD, and the smaller polish particle size is, the larger TCR will be. Annealing process can also significantly improve the TCR of the Pt RTD. After annealing treatment, the TCR increased from 2800 ppm/℃ at 500 ℃ to 3439 ppm/℃ at 1100 ℃.