Sensitivity improvement in FSI CIS using the M1ToP™ smart process technique

Using the W damascene process in the pixel area, M1Top pixel structure was developed. Because the M1Top pixel structure does not use the metal2 layer in the pixel block, total stack height becomes much thinner than normal pixels. From this new structure, sensitivity and QE in 1.75um pixels have been improved by 50% from that of normal M2Top pixels in 0.11um CIS process.